1. Marco Schowalter, Knut Müller, and Andreas Rosenauer. Scattering amplitudes and static atomic correction factors for the composition-sensitive 002 reflection in sphalerite ternary III--V and II--VI semiconductors. Acta Crystallographica Section A, 68(1):68-76, January 2012. [doi:10.1107/S010876731103777] Keyword(s): scattering factors, static atomic displacements, modified atomic scattering amplitudes, correction factor.



2. Marco Schowalter, Andreas Rosenauer, and Kerstin Volz. Parameters for temperature dependence of mean-square displacements for B-, Bi- and Tl-containing binary III-V compounds. Acta Crystallographica Section A, 68(3):319-323, 2012. ISSN: 1600-5724. [doi:10.1107/S0108767312002681] Keyword(s): Debye-Waller factors, mean-square displacements, force constants, phonon density of states, phonon dispersion relations, density functional theory.



3. M. Schowalter, D. Lamoen, A. Rosenauer, P. Kruse, and D. Gerthsen. First-principles calculations of the mean inner Coulomb potential for sphalerite type II-VI semiconductors. Appl. Phys. Lett., 85(21):4938-4940, November 2004. [doi:10.1063/1.1823598] Keyword(s): mip, sphalerite, semiconductor, mean inner Coulomb potential.

1. M. Schowalter, A. Rosenauer, J. Titantah, and D. Lamoen. Computation and parametrization of Debye-Waller temperature factors for sphalerite type II-VI, III-V and group IV semiconductors. In M. Luysberg, K. Tillmann, T. Weirich (Eds.): EMC 2008, Vol. 1: Instrumentation and Methods, pp. 153-154, DOI: 10.1007/978-3-540-85156-1_77, 2008.



2. M. Schowalter, A. Rosenauer, J. Titantah, and D. Lamoen. Temperature dependence of Debye-Waller Factors of sphalerite III-V Semiconductors calculated from Ab Initio Force Constants. In MC 2007, Saarbrücken, Germany, September 2-7, 2007 Microsc. Microanal. 13 (Suppl. 3), 2007, 128 DOI: 10.1017/S1431927607080646, 2007.



3. A Rosenauer and D. Van Dyck. The effect of strain on chemically sensitive imaging with the (002) reflection in sphalerite type crystals. In 12th European Congress on Electron Microscopy (EUREM 12), July 9-14 2000, Brno, Czech Republic, Proceedings, Volume III, I 121, 2000.

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